|
Tool Name
|
Model
|
OEM
|
|
Semiconductor Parametric tester
|
4072A
|
Agilent
|
|
Asher(Resist, after AL)
|
MAS1800
|
ALCANTECH
|
|
Asher(Resist, after AL)
|
MAS1800
|
ALCANTECH
|
|
Asher(Resist, before AL)
|
MAS1800
|
ALCANTECH
|
|
RTP-CVD
|
Centura-HT-POLY / RTPXE
|
AMAT
|
|
RTP-CVD
|
Centura xZ/RTP
|
AMAT
|
|
PE-CVD(Poly)
|
Centura-HT-POLY
|
AMAT
|
|
Dry Etcher(ICP,Metal)
|
Centura DPS Metal Etch
|
AMAT
|
|
PE-CVD(SiN)
|
Producer-S
|
AMAT
|
|
PE-CVD(SiN)
|
Producer-S
|
AMAT
|
|
Dry Etcher(Oxide)
|
Centura-MXP+ OXIDE ETCH 5200
|
AMAT
|
|
Dry Etcher(SiC)
|
CenturaII -eMAX
|
AMAT
|
|
Wafer Surface Defect Analyzer
|
ComPass-Pro
|
AMAT
|
|
CMP(Metal)
|
MIRRA-DESICA
|
AMAT
|
|
PVD - Spatter(AL)
|
ENDURA 5500 HP PVD
|
AMAT
|
|
PVD - Spatter(Co)
|
ENDURA 5500 HP PVD
|
AMAT
|
|
SA-CVD
|
Producer-SACVD
|
AMAT
|
|
CMP(NiFe)
|
MIRRA-DESICA
|
AMAT
|
|
Epi Reactor(SiGe/SiC)
|
Epsilon 2000
|
ASM
|
|
Epi Reactor(SiGe)
|
Epsilon 2000
|
ASM
|
|
Back Side Grinder
|
DFG821IF/8
|
DISCO
|
|
Wafer Scrubber
|
SS-W80A-A
|
DNS
|
|
Wafer Scrubber
|
SS-W80A-AR
|
DNS
|
|
Wet Station(,Solvent,Resist,AL)
|
WSW-8200-RI
|
DNS
|
|
Metorology-Wafer Particle Detector
|
SFS6420
|
KLA-Tencor
|
|
Metorology-Surface Profiler
|
P-2
|
KLA-Tencor
|
|
Metorology - Thin Film Stress
|
F2400
|
KLA-Tencor
|
|
Metorology - Registration
|
KLA-5200
|
KLA-Tencor
|
|
Wafer Prober(Semi Auto)
|
SP-8720
|
MJC
|
|
FT-IR
|
IR-EPOCK2000
|
Newly Instrument
|
|
Microscope(#1) for Litho
|
OPTISTATION3A
|
Nikon
|
|
Microscope(#5) for Litho
|
OPTISTATION3A
|
Nikon
|
|
Microscope(#3)
|
OPTISTATION3A
|
Nikon
|
|
Sorter(Semi Auto)
|
14RR8161
|
RORZE
|
|
Metorology-Ellipsometry
|
FE-3(D)
|
RUDOLPH
|
|
Metorology - Ellipsometry
|
FE-3
|
RUDOLPH
|
|
Solvent Spray Cleaner
|
SST-C-632-280-K
|
SEMITOOL
|
|
Asher(Resist, before AL)
|
SW2000M
|
SUMITOMO
|
|
Asher(Resist, after AL)
|
SW2000M
|
SUMITOMO
|
|
Asher(Resist, before AL)
|
SW1100
|
SUMITOMO
|
|
Asher(Resist, before AL)
|
SW1100
|
SUMITOMO
|
|
Taper
|
ATM-1100
|
Takatori
|
|
Vertical Furnace LP-CVD(D-Poly)
|
a-801C
|
TEL
|
|
Vertical Furnace LP-CVD(D-αSi)
|
a-801CN
|
TEL
|
|
Vertical Furnace LP-CVD(D-αSi)
|
a-808S-ZCN
|
TEL
|
|
Vertical Furnace LP-CVD(Poly)
|
a-803C
|
TEL
|
|
Vertical Furnace Diffusion（Field-Oxide）
|
a-801D
|
TEL
|
|
Vertical Furnace Diffusion（Gate-Oxide）
|
a-801D
|
TEL
|
|
Vertical Furnace Diffusion（Gate-Oxide）
|
a-801D
|
TEL
|
|
Vertical Furnace LP-CVD(SiN)
|
a-803C
|
TEL
|
|
Vertical Furnace LP-CVD(SiN)
|
a-801C
|
TEL
|
|
Vertical Furnace LP-CVD(SiN)
|
a-803C
|
TEL
|
|
Vertical Furnace LP-CVD(HTO/SiON/SiN)
|
a-801C
|
TEL
|
|
Vertical Furnace LP-CVD(HTO)
|
a-803C
|
TEL
|
|
Vertical Furnace LP-CVD(FTP)
|
a-801CN(FTP)
|
TEL
|
|
Vertical Furnace Diffusion（Reflow）
|
a-803D
|
TEL
|
|
Vertical Furnace Diffusion（S/D Anneal）
|
a-803D
|
TEL
|
|
Vertical Furnace Diffusion（Metal Sinter）
|
a-803D
|
TEL
|
|
Coater
|
CLEAN TRACK MARK-8
|
TEL
|
|
Coater
|
CLEAN TRACK MARK-8
|
TEL
|
|
Developer
|
CLEAN TRACK MARK-8
|
TEL
|
|
Developer
|
CLEAN TRACK MARK-8
|
TEL
|
|
Coater(ARC)
|
CLEAN TRACK MARK-8
|
TEL
|
|
Coater
|
CLEAN TRACK MARK-8
|
TEL
|
