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Products
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Refurbished Gasonics Aura 3010
Manufacturer:Gasonics
Refurbished by:Allwin21 Corp
Aura 3010.The Aura 3010(Aura3000) is a single-wafer downstream photoresist
asher, delivers high ash rates with low damage, a large process window, and a
choice of process temperatures during the ashing process. The system has a
user friendly menu-driven user interface, and is suitable for automation via
SMIF (Standard Mechanical Interface) or AGV (Automated Guided Vehicle).3 to 8
inch wafer capability .
• No RF damage (£0.1 volt CV shift)
• High throughput
• Front and backside etching
• Excellent etch rates and uniformities
• 75mm – 200mm wafer capability
• 3 gas MFC
• Variable platen temperature
• Alumina (ceramic) plasma tube
• Well-characterized process
• Multiple step process capability
• High capital productivity.
• Chamber wall heated and temperature controlled to make better repeatability.
GaSonic Aura 3010 Applications:
High dose implant (As+, B+, P+)
Post-polysilicon etch
Post-metal etch
Post-oxide etch
Rework
Controlled Resist Removal
- Post-develop descum
(pre-etch)
Dry/wet process capability
Resist planarization
Uniformity capability (5% 1s)
We can also provide advanced Equip Robot transfer wafer technology , AW
Control Software and Superior Temperature Control Technology to upgrade the
refurbished Gasonics Aura 3010 which provides the following significant
advantages.
- Use Equip robot wafer
transfer instead of the index of the original, which will decrease the
down time and low the wafer damage, particles greatly
- Pentium PC computer
equipped either DOS Windows
- Interface control
board with parallel connectors between PC computer and the system .
- New 16 bits A/D
measurement system to replace original 12 bits A/D system to improve the
accuracy of the measurements of gas flow, vacuum pressure, EOP,
temperature of the wafer, etc. to improve the repeatability of the Asher
process.
- New 14 bits D/A system
to replace original old 8 bits D/A to improve the accuracy of the set
point of the vacuum pressure, gas flow, etc.
- Add new RTP system to
get more accuracy temperature control to improve the repeatability of
the process. The new RTP system includes(1)New lamp control system with
new special solid-state relay control system. It is similar to the oven
control system of the RTP machine;(2)New zero crossing detects system.
It is similar to the zero crossing detect of the RTP machine.(3)K-type
thermocouple system with vacuum feed-through and amplifier to measure
the temperature of the wafer. The thermocouple is touching the backside
of the wafer directly. The feed-through is put on the front door, which
is good when the wafer heated at 450 degree C.(4)Replace the center lamp
of the system to be the same high power as the side one to speed up the
heat speed and improve the uniformity of the asher and descum process.
- User-friendly recipe
editor with gas flow set point, vacuum pressure set point, RF on or off
set up, temperature setup etc.
- New GUI interface with
curves display of the temperature, vacuum pressure, gas flow, RF status,
EOP signal etc. during the process.
- Saved all process data
on the local hard disk and send data to the server if it is needed
(option).
Saved all operation function, date, time and error message on the lot
file.
- Wafer ID reading
function to read wafer ID and use the wafer ID for the data ID to save
the process data. Data saved with 4 layers: (1) directory (say year
2003,2004), (2) lot ID, (3) Date Time or step ID, (4) wafer ID. So it is
easy to trace the data.
- Bar code function for
the lot ID, recipe ID selection option.
- Manual and auto
process running
- System diagnostics for
the quick diagnostic of the system
- Easier I/O set and
checks function for the Maintenance
- RTP function with
temperature control ±1~2°C accuracy from 50 to 500°C with K-type
thermocouple.
- Higher through put.
- Advanced accurate
temperature control to make much better repeatability .
- Better uniformity duo
to the center lamp has the same power as the side lamp .
- All process data saved
and easier for failure analyzer and process debug .
- “Exposed” I/O, A/D,
D/A is easier for troubleshooting and maintenance.
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