Plasma Asher--Branson IPC 3000 Barrel System

Products	Refurbished Branson IPC 3000 Manufacturer:Branson Refurbished by:Allwin21 Corp The Branson IPC 3000 is a barrel plasma etcher that uses oxygen to etch organic films and residues such as photoresist in a process commonly referred to as "de-scumming." During a normal run for the Branson Barrel Etcher, the chamber is evacuated to under 0.5 torr pressure. A regulated flow of oxygen gas is introduced into the chamber and RF energy is applied to the chamber coils, which creates an oxygen plasma which does the etching. The oxygen ions in the plasma react with organics, such as photoresist, oxidizing or descumming the compounds off of the surface. The oxidized organics are pumped out of the Branson Barrel Etcher's chamber as exhaust gas. Branson IPC 3000 Features: POWER RATING : 1000 watts continuous input REACTOR:1ea 10" dia. x 20" long OPERATING PRESSURE RANGE:0.1 - 10 torr VACUUM SEALS : Silicone O rings and bell jar gasket REACTOR WINDOW: Hinged and spring loaded, with latch for open position PRESSURE TRANSDUCER: Thermocouple type IMPEDANCE CONTROL: Matches from 10-1000 watts to present input impedance of 50 ohms at RF power input connector. Automatic impedance matching once preset. Branson IPC 3000 Applications: Photoresist Stripping High dose implant (As+, B+, P+) Post-polysilicon etch Post-metal etch Post-oxide etch Rework Controlled Resist Removal Post-develop descum (pre-etch) Dry/wet process capability Resist planarization Uniformity capability We can also provide advanced AW Control Software and Superior Temperature Control Technology to upgrade the refurbished Branson IPC 3000 which provides the following significant advantages. * Auto processing with RF, gas flow and timer set up * 1 process gas with MFC * Upgrade with new software and controller * Touch screen * 4 gases by MFC(Option,50 sccm up to 30000 sccm,control up to 6 valves include main vacuum valve and vent or purge valve..) * Baratron to read the pressure(Option) * Throttle valve to control the pressure to keep the process repeatable(Option) * ENI RF generator either ACG series(Option) without water cooling or EOM-6, OEM-12b(Option) series with cooling water
Rapid Thermal Process
AccuThermo AW 410
AccuThermo AW 610
AccuThermo AW 810
AG Heatpulse 210
AG Heatpulse 410
AG Heatpulse 610
Used Plasma Asher
Matrix 105
Matrix 10
Gasonics Aura 1000
Gasonics Aura 3010
Gasonics Aura 2000LL
Branson IPC 3000
Branson IPC L3200
Used Plasma Etcher
Matrix 303
Gasonics AE 2001
AutoEtch Lam 490
Lam Rainbow 4520 Oxide Etch
Lam 4428 for Plasma Etch
Used Electrical Test
PCM Software
HP 4062UX
HP 4145B
EG 1034
EG 2001
EG HORIZON 4085X
Temptronic TP03500
Used Metrology Instruments
Hitachi S8840
Hitachi FE-SEM model S-4160
Hitachi S-4500
Hitachi S-4700
Hitachi S-8820
Hitachi S-9300
Micrion FIB model M9500
LEO FE-SEM model 982
Other Semiconductor Equipment

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PlasmaEquipments is DBA of Allwin21 Corp.